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05- International Journal of Thin Film Science and Technology
An International Journal
               
 
 
 
 
 
 
 
 
 
 
 
 

Content
 

Volumes > Vol. 8 > No. 1

 
   

Variation of Distribution of Concentration of Implanted Impurity with into Account Mismatch-Induced Stresses under Influence of Variation of Substrate Temperature

PP: 9-29
doi:10.18576/ijtfst/080103
Author(s)
E. L. Pankratov,
Abstract
In this paper, an analysis is made of the mutual effect of radiation damage to the heterostructure during ion doping, substrate temperature during doping, and mismatch-induced stresses.

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