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05- International Journal of Thin Film Science and Technology



Effect of KrF laser irradiation on the morphology and microstructure of amorphous PZT thin films grown by RF magnetron sputtering

mohammed mahdi,
Abstract :
This work deals with the crystallization of amorphous PZT thin films, induced by 248 nm KrF laser source. The as-grown 250 nm of PZT thin films using RF magnetron system, on tree different substrate (Si/SiO2/Ti/Pt, Si/SiO2, and glass/Al) are treated from 10 to 100 mj/cm. The morphology is investigated by scanning electron microscopy (SEM) and surface roughness by scanning probe microscopy (SPM). The microstructure using X-ray diffraction (XRD) and ellipsometry. The Si/SiO2/Ti/Pt/PZT samples morphology investigation shows the formation of square wells of 10 m side on the surface. However, the roughness measured is 11 nm. The microstructure analysis shows good crystallization following (110) dominant orientation with a grain size of 229.64 nm at 30, 25, and 20 mj/cm. For Si/SiO2/PZT samples, the surface morphology has seriously deteriorated. The microstructure analyses show the emerging of a weak peak of (110) plan with 110 nm of grain size, at 20 mj/cm however ablation starts at 25 mj/cm, at low energy 10 and 15 mj/cm only pyrochlore phase is observed. For glass/Al/PZT ablation occur at 15 mj/cm and microstructure analysis shows the amorphous phase at 10 mj/cm.

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