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Steady State Creep Characteristics of Sn96.5Ag3.5 Based Alloys, Vol. 7, No. 2 (May 2018), PP:49-59
doi:10.18576/ijtfst/070201
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Authors: |
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M. Y. Salem - Physics Department, Faculty of Science at New Valley, Assuit University, 72511, El-Kharga, Egypt.
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How to Cite:
M. Y. Salem, Steady State Creep Characteristics of Sn96.5Ag3.5 Based Alloys, International Journal of Thin Film Science and Technology, Vol. 7, No. 2, pp: 49-59, 2018, Doi: https://dx.doi.org/10.18576/ijtfst/070201
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Influence of Deposition Parameters on Optical Properties of Sputtered Tungsten Oxide Films, Vol. 7, No. 2 (May 2018), PP:61-65
doi:10.18576/ijtfst/070202
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Authors: |
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Christopher Mkirema Maghanga - Department of Biological & Physical Sciences, Kabarak University, P.O. Private Bag -20157 Kabarak, Kenya.
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How to Cite:
Christopher Mkirema Maghanga, Influence of Deposition Parameters on Optical Properties of Sputtered Tungsten Oxide Films, International Journal of Thin Film Science and Technology, Vol. 7, No. 2, pp: 61-65, 2018, Doi: https://dx.doi.org/10.18576/ijtfst/070202
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Models, Methods and Measurements of Thin Films Resistivities of Ni/Cu Bi layers and Ni/Pd/Cu Tri layers Films., Vol. 7, No. 2 (May 2018), PP:67-71
doi:10.18576/ijtfst/070203
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Authors: |
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M. K. Loudjani - Université Paris-Saclay, Institut de Chimie Moléculaire et des Matériaux dOrsay (ICMMO), UMR 8182 (CNRS), Equipe Synthèse, Propriétés et Modélisation des Matériaux (SP2M), Bât 410, Bur. 350, Rue du Doyen Georges Poitou 91405 Orsay Cedex, France.
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C. Sella - Institut des Nano-Sciences de Paris, Université de Paris-VI, campus Boucicaut, 140 rue de Lourmel 75015 Paris, France.
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How to Cite:
M. K. Loudjani, C. Sella, Models, Methods and Measurements of Thin Films Resistivities of Ni/Cu Bi layers and Ni/Pd/Cu Tri layers Films., International Journal of Thin Film Science and Technology, Vol. 7, No. 2, pp: 67-71, 2018, Doi: https://dx.doi.org/10.18576/ijtfst/070203
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On Optimization of Manufacturing of A High-Voltage Current Driver Based on Hetero Structures to Increase Density of Their Elements. Influence of Miss-Match Induced Stress and Porosity of Materials on Technological Process, Vol. 7, No. 2 (May 2018), PP:73-94
doi:10.18576/ijtfst/070204
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Authors: |
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E. L. Pankratov - Nizhny Novgorod State University, 23 Gagarin avenue, Nizhny Novgorod, 603950, Russia.
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How to Cite:
E. L. Pankratov, On Optimization of Manufacturing of A High-Voltage Current Driver Based on Hetero Structures to Increase Density of Their Elements. Influence of Miss-Match Induced Stress and Porosity of Materials on Technological Process, International Journal of Thin Film Science and Technology, Vol. 7, No. 2, pp: 73-94, 2018, Doi: https://dx.doi.org/10.18576/ijtfst/070204
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