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Magnetization Behaviour of Nanocrystalline Permalloy Thin Films Prepared Using Oblique-angle Magnetron Sputtering Technique |
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PP: 301-305 |
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doi:10.18576/ijtfst/110306
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Author(s) |
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Kh. Gheisari,
C. K. Ong,
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Abstract |
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| In the current work, nanocrystalline Fe0.5Ni0.5 magnetic thin films were deposited on a Si(100) substrate using the oblique-angle sputtering technique with the oblique deposition angle ranging from 11.5 to 45°. Structure, static magnetic properties, and dynamic magnetic characteristics were evaluated as a function of the deposition angle. The results indicate that the nanocrystalline FCC phase of FeNi with (111) preferred orientation and the average crystallite size of 6.3-9.3 nm was deposited successfully. The measured value of the uniaxial anisotropy field shows an increment from 7.65 to 16.71 Oe as the oblique angle rises from 11.5 to 45°, which in turn leads to an increase in the ferromagnetic resonance frequency from 0.63 to 0.88 GHz.
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