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Optimization of the Cathodic Sputtering Process for Fabricating Thin Film Materials used in Modern Photovoltaic Applications |
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PP: 101-105 |
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doi:10.18576/ijtfst/130203
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Author(s) |
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Abdelkader BOUAZZA,
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Abstract |
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| This study aims to optimize cathodic sputtering techniques to produce high-quality thin films for modern photovoltaic (PV) applications. Sputtering is a widely utilized deposition method known for its ability to generate superior thin films, thus potentially improving the performance of PV devices. This research focuses on investigating materials such as cadmium sulfide (CdS), copper-indium-gallium-selenium (CIGS), and perovskites (CH3NH3PbI3), which possess optical, electrical, and structural properties suitable for PV applications. The primary aim of this study is to enhance our understanding of cathodic sputtering by examining key parameters that influence thin film deposition. Various factors, including vacuum chamber energy, incidence angles, and gas composition, were analyzed to determine their effects. Our findings demonstrate that the sputtering yield is superior when employing Argon gas compared to Nitrogen and Xenon. Additionally, increasing the incidence angle and bombardment energy produces a proportional boost in the sputtering yield until an optimum value is reached. These parameters significantly contribute to the quality of the obtained thin films. Furthermore, our results are consistent with previous research, thus providing validation for our calculations.
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