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International Journal of Thin Films Science and Technology
An International Journal
               
 
 
 
 
 
 
 
 
 
 

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Volumes > Vol. 2 > No. 2

 
   

Photolithography versus lift off process for patterning of sputtered indium tin oxide for flexible displays

PP: 67-75
Author(s)
Mariya Aleksandrova, Georgy Kolev, Ivelina Cholakova, Georgy Dobrikov, Georgy Bodurov,
Abstract
Indium tin oxide (ITO) is deposited by RF sputtering on polyethylene terephthalate substrate as transparent electrode for flexible display applications. The produced coatings are patterned in form of digits for seven-segmented indication via conventional photolithography and lift off process. The influence of the exposure dose, etching and stripping solution on the electrophysical properties of ITO films and achieved image resolution were investigated. The sheet resistance increases from 66.5 Ω/square to 101.9 Ω/square after wet etching. The undercut is 6μm for 2 mm wide segment, which is satisfactory for digital indication. After lift off, no undercut is observed, but ITO sheet resistance increases to 197 Ω/square. In both cases ITO film’s transmittance for the visible light remains higher than 89 %.

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